The SPIE Advanced Lithography + Patterning focuses on innovations in nanolithography, patterning technologies, and process integration for advanced semiconductor manufacturing.
Topics
- DTCO and Computational Patterning
- Optical and EUV Nanolithography
- Novel Patterning Technologies
- Metrology, Inspection, and Process Control
- Advanced Etch Technology and Process Integration for Nanopatterning
- Advances in Patterning Materials and Processes
Who should Attend
The lithography community, including researchers and managers working in the lithography industry.
