SPIE Photomask Technology 2015

  • 29 Sep - 01 Oct, 2015
  • Monterey Conference Center, CA, United States

Description

Topics
  • Mask Application
    Design for manufacturability, Patterned media, Source and mask optimization, Resolution enhancement techniques and OPC, Simulation and modeling, Double- and multi-patterning.
  • Emerging Mask Technologies
    Mask process correction, EUV mask making, Pixelated masks, Direct-write, EUV mask inspection and repair, Nanoimprint mask making, Nanoimprint mask application, ML² and Grey-scale masks, Alternative mask technologies, EUV mask infrastructure.
  • Mask Making
    Substrates and materials, contamination, Metrology, haze, Repair, Patterning tools and processes, Etch techniques, Inspection, Simulation of mask making, Mask data preparation, Resist and resist processing , Cleaning.
  • Mask Business
    Business aspects of mask, Mask management in wafer fabs and Infrastructure, Mask manufacturing control , Mask shop management.

SPIE Photomask Technology exhibition presents components, software, and manufacturing equipment covering technologies such as: Optical/laser microlithography, Nanotechnology, Software, EUV, Resist technology and processing, Lasers, Electronic imaging components, Metrology and Electron-beam lithography.

Past Events

Important

Please, check "SPIE Photomask Technology" official website for possible changes, before making any traveling arrangements

Event Categories

Science: Engineering, Physics
Technology: Materials, Optics

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